TY - GEN
T1 - A Basic Psychophysics Study of Visual Masking Effect on Kanji Recognition for Image Recognition Technology
AU - Dai, Qi
AU - Yao, Lichang
AU - Hattori, Ikue
AU - Wu, Qiong
AU - Yang, Jiajia
AU - Takahashi, Satoshi
AU - Ejima, Yoshimichi
AU - Wu, Jinglong
N1 - Funding Information:
This research was supported by JAPAN SOCIETY FOR THE PROMOTION OF SCIENCE (JSPS) KAKENHI grant number 18H01411, 18K18835, 19KK0099 and 20K07722. A Grant-in-Aid for Strategic Research Promotion from Okayama University. In addition, this research was supported by the Social Science project of Suzhou University of science and Technology (332012902, 341922905). I appreciate that the support from co-author Ikue Hattori. We would like to express our gratitude to the participants who participated in our research.
Publisher Copyright:
© 2021 IEEE.
PY - 2021/8/8
Y1 - 2021/8/8
N2 - The masking paradigm is the most used method for generating subliminal stimuli. When both the target stimulus and the mask stimulus are composed of spatial pattern, the mask reduces the visibility of the target. It was called pattern masking effect. Japanese kanji as special visual semantic information, especially when kanji as a subliminal visual stimulus, it is not clear whether Kanji is regulated by the pattern masking effect. Therefore, in this study, we measured the sensitivity index of Kanji detection or discrimination in the masking paradigm using the calculation method of SDT (Signal Detection Theory). By this way, present study investigated the intensity of the masking effect. Results suggested that the sensitivity index of Kanji have the significant difference between the different target presentation time both of detection and discrimination task. As the presentation time is longer, the sensitivity index increases. Results also showed that there is a difference in the cognitive process between detection and discrimination of stimuli, and even if the stimuli can be detected, they may not be discriminated. In addition, as the intensity of the stimulus increased, the intensity of the masking effect became weaker, and it was found that the pattern mask also produces a masking effect in the detection and discrimination of Kanji. According to the research on human visual processing characteristics, it is hoped to help improve the efficiency of computer vision recognition technology.
AB - The masking paradigm is the most used method for generating subliminal stimuli. When both the target stimulus and the mask stimulus are composed of spatial pattern, the mask reduces the visibility of the target. It was called pattern masking effect. Japanese kanji as special visual semantic information, especially when kanji as a subliminal visual stimulus, it is not clear whether Kanji is regulated by the pattern masking effect. Therefore, in this study, we measured the sensitivity index of Kanji detection or discrimination in the masking paradigm using the calculation method of SDT (Signal Detection Theory). By this way, present study investigated the intensity of the masking effect. Results suggested that the sensitivity index of Kanji have the significant difference between the different target presentation time both of detection and discrimination task. As the presentation time is longer, the sensitivity index increases. Results also showed that there is a difference in the cognitive process between detection and discrimination of stimuli, and even if the stimuli can be detected, they may not be discriminated. In addition, as the intensity of the stimulus increased, the intensity of the masking effect became weaker, and it was found that the pattern mask also produces a masking effect in the detection and discrimination of Kanji. According to the research on human visual processing characteristics, it is hoped to help improve the efficiency of computer vision recognition technology.
KW - Japanese kanji
KW - Signal Detection Theory
KW - Subliminal stimuli
KW - Visual detection and discrimination task
KW - Visual masking effect
UR - http://www.scopus.com/inward/record.url?scp=85115191854&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=85115191854&partnerID=8YFLogxK
U2 - 10.1109/ICMA52036.2021.9512762
DO - 10.1109/ICMA52036.2021.9512762
M3 - Conference contribution
AN - SCOPUS:85115191854
T3 - 2021 IEEE International Conference on Mechatronics and Automation, ICMA 2021
SP - 1292
EP - 1297
BT - 2021 IEEE International Conference on Mechatronics and Automation, ICMA 2021
PB - Institute of Electrical and Electronics Engineers Inc.
T2 - 18th IEEE International Conference on Mechatronics and Automation, ICMA 2021
Y2 - 8 August 2021 through 11 August 2021
ER -