Characterization of structural dynamics of VO2 thin film on c-Al2O3 using in-air time-resolved x-ray diffraction

Masaki Hada, Kunio Okimura, Jiro Matsuo

    Research output: Contribution to journalArticlepeer-review

    63 Citations (Scopus)


    The lattice motion and displacement of atoms in the unit cell in vanadium dioxide (VO2) grown on c -Al2O3 were characterized by static and time-resolved x-ray diffraction (XRD) measurements. The monoclinic-tetragonal phase transition of the VO2 unit cell and the twist motion of vanadium atoms in the unit cell were observed. The time-resolved XRD measurements were performed in air using a tabletop high-repetition femtosecond laser. The results obtained from the time-resolved XRD measurements suggested that the unit cell of the low-temperature monoclinic VO2 transformed into the high-temperature tetragonal phase extremely rapidly (within 25 ps); however, the atoms in the unit cell fluctuated or vibrated about the center of the tetragonal coordinates, which abated within ∼100 ps. Thus, the time-resolved XRD measurements of the Bragg angle, intensity, and width of the diffraction lines simultaneously revealed the phase transition of VO2 and the atomic motion in the unit cell.

    Original languageEnglish
    Article number153401
    JournalPhysical Review B - Condensed Matter and Materials Physics
    Issue number15
    Publication statusPublished - Oct 5 2010

    ASJC Scopus subject areas

    • Electronic, Optical and Magnetic Materials
    • Condensed Matter Physics


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