Abstract
Extreme ultraviolet (EUV) emission from Xe plasma in the λ=13.5 nm band is theoretically investigated for lithographic application. It appears that a large number of satellite lines due to the 4d-4f, 4d-5p, and 4p-4d transitions significantly contribute to the emission over the spectral range from 10 to 17 nm. At electron densities above 1020 cm3, laser-produced Xe plasmas attain quasilocal thermodynamic equilibrium (LTE) in order to make the emission intensity in the 13.5 nm band comparable to that in the 11 nm band.
Original language | English |
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Pages (from-to) | 5857-5859 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 85 |
Issue number | 24 |
DOIs | |
Publication status | Published - Dec 13 2004 |
ASJC Scopus subject areas
- Physics and Astronomy (miscellaneous)