Fabrication and application of TiO2-based superhydrophilic- superhydrophobic patterns on titanium substrates for offset printing

Kazuya Nakata; Shunsuke Nishimoto; Atsushi Kubo; Donald Tryk; Tsuyoshi Ochiai; Taketoshi Murakami; Akira Fujishima

doi:10.1002/asia.200900005

Fabrication and application of TiO₂-based superhydrophilic- superhydrophobic patterns on titanium substrates for offset printing

Kazuya Nakata, Shunsuke Nishimoto, Atsushi Kubo, Donald Tryk, Tsuyoshi Ochiai, Taketoshi Murakami, Akira Fujishima

Research output: Contribution to journal › Article › peer-review

50 Citations (Scopus)

Abstract

A fabrication process for superhydrophilic-patterns titanium substrates prepared a combination of an ink-jet and site-selective decomposition a self-assembled monolayer (SAM) by a TiO2 photocatalyst under irradiation is described. We demonstrate the prepared titanium is applicable as an offset plate with high resolution (133 150 lines per inch). Furthermore, superhydrophilic-superhydrophobic on the substrate can be deposited after elimination of the by photocatalytic decomposition TiO₂ under UV irradiation. A printed image with the renewed showed no significant difference image quality compared with the initial image.

Original language	English
Pages (from-to)	984-988
Number of pages	5
Journal	Chemistry - An Asian Journal
Volume	4
Issue number	6
DOIs	https://doi.org/10.1002/asia.200900005
Publication status	Published - Jun 2 2009
Externally published	Yes

Keywords

Patterning
Photochemistry
Surface chemistry
Titanium
Wettability

ASJC Scopus subject areas

Biochemistry
Organic Chemistry

Access to Document

10.1002/asia.200900005

Cite this

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title = "Fabrication and application of TiO2-based superhydrophilic- superhydrophobic patterns on titanium substrates for offset printing",

abstract = "A fabrication process for superhydrophilic-patterns titanium substrates prepared a combination of an ink-jet and site-selective decomposition a self-assembled monolayer (SAM) by a TiO2 photocatalyst under irradiation is described. We demonstrate the prepared titanium is applicable as an offset plate with high resolution (133 150 lines per inch). Furthermore, superhydrophilic-superhydrophobic on the substrate can be deposited after elimination of the by photocatalytic decomposition TiO2 under UV irradiation. A printed image with the renewed showed no significant difference image quality compared with the initial image.",

keywords = "Patterning, Photochemistry, Surface chemistry, Titanium, Wettability",

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AU - Nakata, Kazuya

AU - Nishimoto, Shunsuke

AU - Kubo, Atsushi

AU - Tryk, Donald

AU - Ochiai, Tsuyoshi

AU - Murakami, Taketoshi

AU - Fujishima, Akira

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AB - A fabrication process for superhydrophilic-patterns titanium substrates prepared a combination of an ink-jet and site-selective decomposition a self-assembled monolayer (SAM) by a TiO2 photocatalyst under irradiation is described. We demonstrate the prepared titanium is applicable as an offset plate with high resolution (133 150 lines per inch). Furthermore, superhydrophilic-superhydrophobic on the substrate can be deposited after elimination of the by photocatalytic decomposition TiO2 under UV irradiation. A printed image with the renewed showed no significant difference image quality compared with the initial image.

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KW - Photochemistry

KW - Surface chemistry

KW - Titanium

KW - Wettability

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