High growth rate of vertically aligned carbon nanotubes using a plasma shield in microwave plasma-enhanced chemical vapor deposition

Hiroshi Kinoshita, Ippei Kume, Hirokazu Sakai, Masahito Tagawa, Nobuo Ohmae

    Research output: Contribution to journalArticlepeer-review

    12 Citations (Scopus)

    Abstract

    The vertically aligned carbon nanotubes were synthesized using microwave plasma-enhanced chemical vapor deposition. The high growth rate was achieved by avoiding the direct plasma irradiation on a substrate, in which the growth of carbon nanotubes occurs, using a plasma shield. Transmission electron microscopy and scanning electron microscopy were used to investigate the synthesis of carbon nanotubes without and with the plasma shield. It was found that the synthesis process of the carbon nanotubes with the shield possessed two growth stages, and the growth rate in the fast growth stage was 280 nm/s.

    Original languageEnglish
    Pages (from-to)2753-2756
    Number of pages4
    JournalCarbon
    Volume42
    Issue number12-13
    DOIs
    Publication statusPublished - 2004

    Keywords

    • A. Carbon nanotubes
    • B. Chemical vapor deposition
    • C. Electron microscopy

    ASJC Scopus subject areas

    • General Chemistry
    • General Materials Science

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