TY - JOUR
T1 - High-space resolution imaging plate analysis of extreme ultraviolet (EUV) light from tin laser-produced plasmas
AU - Musgrave, Christopher S.A.
AU - Murakami, Takehiro
AU - Ugomori, Teruyuki
AU - Yoshida, Kensuke
AU - Fujioka, Shinsuke
AU - Nishimura, Hiroaki
AU - Atarashi, Hironori
AU - Iyoda, Tomokazu
AU - Nagai, Keiji
N1 - Funding Information:
The authors declare that they have no competing interests. The authors would like to thank staff and researchers at ILE, Osaka, for access and assistance in experiments, particularly to Mr. Eiji Sato. The authors would like to thank the Japan Science and Technology agency for funding under the ERATO project. A part of this work was performed under the joint research project of the Institute of Laser Engineering, Osaka University.
Publisher Copyright:
© 2017 Author(s).
PY - 2017/3/1
Y1 - 2017/3/1
N2 - With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.
AB - With the advent of high volume manufacturing capabilities by extreme ultraviolet lithography, constant improvements in light source design and cost-efficiency are required. Currently, light intensity and conversion efficiency (CE) measurments are obtained by charged couple devices, faraday cups etc, but also phoshpor imaging plates (IPs) (BaFBr:Eu). IPs are sensitive to light and high-energy species, which is ideal for studying extreme ultraviolet (EUV) light from laser produced plasmas (LPPs). In this work, we used IPs to observe a large angular distribution (10°-90°). We ablated a tin target by high-energy lasers (1064 nm Nd:YAG, 1010 and 1011 W/cm2) to generate the EUV light. The europium ions in the IP were trapped in a higher energy state from exposure to EUV light and high-energy species. The light intensity was angular dependent; therefore excitation of the IP depends on the angle, and so highly informative about the LPP. We obtained high-space resolution (345 μm, 0.2°) angular distribution and grazing spectrometer (5-20 nm grate) data simultaneously at different target to IP distances (103 mm and 200 mm). Two laser systems and IP types (BAS-TR and BAS-SR) were also compared. The cosine fitting values from the IP data were used to calculate the CE to be 1.6% (SD ± 0.2) at 13.5 nm 2% bandwidth. Finally, a practical assessment of IPs and a damage issue are disclosed.
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U2 - 10.1063/1.4978526
DO - 10.1063/1.4978526
M3 - Article
C2 - 28372444
AN - SCOPUS:85016155499
SN - 0034-6748
VL - 88
JO - Review of Scientific Instruments
JF - Review of Scientific Instruments
IS - 3
M1 - 033506
ER -