TY - JOUR
T1 - Mechanisms of Adhesive Micropatterning of Functional Colloid Thin Layers
AU - Kusaka, Yasuyuki
AU - Takei, Atsushi
AU - Fukasawa, Tomonori
AU - Ishigami, Toru
AU - Fukuda, Nobuko
N1 - Publisher Copyright:
Copyright © 2019 American Chemical Society.
PY - 2019/10/30
Y1 - 2019/10/30
N2 - Thin-film layers of nanoparticles exhibit mechanical fragility that depends on their interactions. Balancing the cohesive force of particles with their interfacial adhesion to a substrate enables the selective transfer of micrometer-scale layer features. Here, the versatility of this adhesion-based transfer approach from poly(dimethylsiloxane) (PDMS) is presented by demonstrating micropatterns of various functional nanoparticulate materials, including Ag, Cu, indium tin oxide, poly(3,4-ethylenedioxythiophene) polystyrene sulfonate, and dielectric silica. With the attachment of the Johnson-Kendall-Roberts interaction to a simple strain model of particle layers during the patterning process, the patterning criteria for successful printing at both macroscale and nanoscale levels are deduced. Discrete element modeling analysis was used to validate the scaling laws and to highlight the fracture modes of particle layers during the patterning process. In particular, the balance among cohesive forces in the tensile direction and in the shear direction and the adhesion force at the layer-PDMS interface mainly regulates the patterning quality of adhesion patterning.
AB - Thin-film layers of nanoparticles exhibit mechanical fragility that depends on their interactions. Balancing the cohesive force of particles with their interfacial adhesion to a substrate enables the selective transfer of micrometer-scale layer features. Here, the versatility of this adhesion-based transfer approach from poly(dimethylsiloxane) (PDMS) is presented by demonstrating micropatterns of various functional nanoparticulate materials, including Ag, Cu, indium tin oxide, poly(3,4-ethylenedioxythiophene) polystyrene sulfonate, and dielectric silica. With the attachment of the Johnson-Kendall-Roberts interaction to a simple strain model of particle layers during the patterning process, the patterning criteria for successful printing at both macroscale and nanoscale levels are deduced. Discrete element modeling analysis was used to validate the scaling laws and to highlight the fracture modes of particle layers during the patterning process. In particular, the balance among cohesive forces in the tensile direction and in the shear direction and the adhesion force at the layer-PDMS interface mainly regulates the patterning quality of adhesion patterning.
KW - adhesion
KW - fracture
KW - patterning
KW - printing
KW - strain
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U2 - 10.1021/acsami.9b13467
DO - 10.1021/acsami.9b13467
M3 - Article
C2 - 31569944
AN - SCOPUS:85073067356
SN - 1944-8244
VL - 11
SP - 40602
EP - 40612
JO - ACS applied materials & interfaces
JF - ACS applied materials & interfaces
IS - 43
ER -