Modeling of the atomic processes in the laser-plasma EUV sources

Sasaki, K. Nishihara, F. Koike, K. Kagawa, H. Tanuma, A. Sunahara, K. Gamada, T. Nishikawa

Research output: Contribution to journalConference articlepeer-review


We develop an atomic model for the Xe and Sn plasmas based on the calculated atomic data for the theoretical investigatiion of the laser plasma EUV source. The wavelength and intensity of the emission lines of Xe 8-16+ and Sn4-12+ are investigated, and the dominant charge state and emission channels for the radiation at 13.5 nm are identified. The emissivity and opacity at the collisional radiative equilibrium (CRE) are calculated, and their spectral properties are investigated with respect to the accuracy of the wavelength of major emission lines and the effect of satellite lines.

Original languageEnglish
Article number115
Pages (from-to)935-942
Number of pages8
JournalProgress in Biomedical Optics and Imaging - Proceedings of SPIE
Issue numberII
Publication statusPublished - Sept 19 2005
EventEmerging Lithographic Technologies IX - San Jose, CA, United States
Duration: Mar 1 2005Mar 3 2005


  • Atomic process
  • Emissivity
  • EUV lithography
  • Opacity
  • Plasma spectroscopy
  • Simulation

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Biomaterials
  • Atomic and Molecular Physics, and Optics
  • Radiology Nuclear Medicine and imaging


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