Modulation of young's modulus of poly(methyl methacrylate) nanobeam due to electron-beam exposure

Kenji Yamazaki; Toru Yamaguchi; Hiroshi Yamaguchi

doi:10.1143/JJAP.46.L1225

Modulation of young's modulus of poly(methyl methacrylate) nanobeam due to electron-beam exposure

Kenji Yamazaki, Toru Yamaguchi, Hiroshi Yamaguchi

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

We fabricated suspended poly(methyl methacrylate) (PMMA) micro/nanobeams using a novel two-step development process. Young's moduli measured for the fabricated beams were found to decrease with additional electron-beam (EB) exposure. This means that we can locally control Young's modulus in PMMA structure using EB exposure and thus effectively design nanoelectromechanical systems using this organic material. The effect was more significant for smaller beams, suggesting that the modulus of the near-surface region is largely affected.

Original language	English
Pages (from-to)	L1225-L1227
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	46
Issue number	45-49
DOIs	https://doi.org/10.1143/JJAP.46.L1225
Publication status	Published - Dec 14 2007
Externally published	Yes

Keywords

EB exposure
EB lithography
Elastic modulus
NEMS
Nanomechanics
Nanostructure
PMMA

ASJC Scopus subject areas

Engineering(all)
Physics and Astronomy (miscellaneous)
Physics and Astronomy(all)

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10.1143/JJAP.46.L1225

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title = "Modulation of young's modulus of poly(methyl methacrylate) nanobeam due to electron-beam exposure",

abstract = "We fabricated suspended poly(methyl methacrylate) (PMMA) micro/nanobeams using a novel two-step development process. Young's moduli measured for the fabricated beams were found to decrease with additional electron-beam (EB) exposure. This means that we can locally control Young's modulus in PMMA structure using EB exposure and thus effectively design nanoelectromechanical systems using this organic material. The effect was more significant for smaller beams, suggesting that the modulus of the near-surface region is largely affected.",

keywords = "EB exposure, EB lithography, Elastic modulus, NEMS, Nanomechanics, Nanostructure, PMMA",

author = "Kenji Yamazaki and Toru Yamaguchi and Hiroshi Yamaguchi",

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volume = "46",

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T1 - Modulation of young's modulus of poly(methyl methacrylate) nanobeam due to electron-beam exposure

AU - Yamazaki, Kenji

AU - Yamaguchi, Toru

AU - Yamaguchi, Hiroshi

PY - 2007/12/14

Y1 - 2007/12/14

N2 - We fabricated suspended poly(methyl methacrylate) (PMMA) micro/nanobeams using a novel two-step development process. Young's moduli measured for the fabricated beams were found to decrease with additional electron-beam (EB) exposure. This means that we can locally control Young's modulus in PMMA structure using EB exposure and thus effectively design nanoelectromechanical systems using this organic material. The effect was more significant for smaller beams, suggesting that the modulus of the near-surface region is largely affected.

AB - We fabricated suspended poly(methyl methacrylate) (PMMA) micro/nanobeams using a novel two-step development process. Young's moduli measured for the fabricated beams were found to decrease with additional electron-beam (EB) exposure. This means that we can locally control Young's modulus in PMMA structure using EB exposure and thus effectively design nanoelectromechanical systems using this organic material. The effect was more significant for smaller beams, suggesting that the modulus of the near-surface region is largely affected.

KW - EB exposure

KW - EB lithography

KW - Elastic modulus

KW - NEMS

KW - Nanomechanics

KW - Nanostructure

KW - PMMA

UR - http://www.scopus.com/inward/record.url?scp=54249089415&partnerID=8YFLogxK

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M3 - Article

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SN - 0021-4922

VL - 46

SP - L1225-L1227

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

IS - 45-49

ER -

Modulation of young's modulus of poly(methyl methacrylate) nanobeam due to electron-beam exposure

Abstract

Keywords

ASJC Scopus subject areas

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