Abstract
We describe a new pixel detector development project using a 0.15 μm fully-depleted CMOS SOI (Silicon-On-Insulator) technology. Additional processing steps for creating substrate implants and contacts to form sensor and electrode connections were developed for this SOI process. A diode Test Element Group and several test chips have been fabricated and evaluated. The pixel detectors are successfully operated and first images are taken and sensibility to β-rays is confirmed. Back gate effects on the top circuits are observed and discussed.
Original language | English |
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Title of host publication | 2006 IEEE Nuclear Science Symposium - Conference Record |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
Pages | 1440-1444 |
Number of pages | 5 |
ISBN (Print) | 1424405610, 9781424405619 |
DOIs | |
Publication status | Published - 2006 |
Externally published | Yes |
Event | 2006 IEEE Nuclear Science Symposium, Medical Imaging Conference and 15th International Workshop on Room-Temperature Semiconductor X- and Gamma-Ray Detectors, Special Focus Workshops, NSS/MIC/RTSD - San Diego, CA, United States Duration: Oct 29 2006 → Nov 4 2006 |
Publication series
Name | IEEE Nuclear Science Symposium Conference Record |
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Volume | 3 |
ISSN (Print) | 1095-7863 |
Other
Other | 2006 IEEE Nuclear Science Symposium, Medical Imaging Conference and 15th International Workshop on Room-Temperature Semiconductor X- and Gamma-Ray Detectors, Special Focus Workshops, NSS/MIC/RTSD |
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Country/Territory | United States |
City | San Diego, CA |
Period | 10/29/06 → 11/4/06 |
ASJC Scopus subject areas
- Radiation
- Nuclear and High Energy Physics
- Radiology Nuclear Medicine and imaging