Abstract
Hybrid films of multilayer graphene (MG) containing amorphous carbon (a-C) were synthesized on Al substrates by microwave surface-wave plasma chemical vapor deposition. Raman scattering and surface transmission electron microscopy showed that the carbon films contained a large quantity of MG when a radio frequency (RF) substrate bias was not applied. Amorphization of graphene in the carbon film was promoted by applying an RF bias, which generated Ar+ in the plasma. The bandgaps of the films were found to increase as the Raman intensity ratios between the 2D-band (at 2700cm-1) and D-band (at 1350cm-1) decreased, indicating the formation of a-C. The MG/a-C all-sp2 phase of carbon hybrid films exhibited an increase in current density under 5mW/cm2 of AM1.5G solar simulated irradiation as the RF bias increased because of Ar+-induced amorphization of the graphene.
Original language | English |
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Journal | Surface and Interface Analysis |
DOIs | |
Publication status | Accepted/In press - 2016 |
Keywords
- Amorphous carbon
- Graphene
- Hybrid carbon film
- Microwave surface-wave plasma CVD
- Raman
- Transmission electron microscopy (TEM)
ASJC Scopus subject areas
- Chemistry(all)
- Condensed Matter Physics
- Surfaces and Interfaces
- Surfaces, Coatings and Films
- Materials Chemistry