TY - JOUR
T1 - Negative-ion implantation technique
AU - Ishikawa, Junzo
AU - Tsuji, Hiroshi
AU - Toyota, Yoshitaka
AU - Gotoh, Yasuhito
AU - Matsuda, Koji
AU - Tanjyo, Masayasu
AU - Sakai, Shigeki
PY - 1995/3/1
Y1 - 1995/3/1
N2 - Negative-ion implantation is a promising technique for charging-free implantation for the forthcoming ULSI fabrication, in which the water charging by positive-ion implantation will become a troublesome problem even with an electron shower. The negative-ion implantation technique remarkably ameliorates such a charging problem since the incoming negative charge of implanted negative ions is easily balanced by the outgoing negative charge of a part of secondary electrons. Thus, the surface charging voltage is maintained to within about ± 10 V for isolated conducting materials and insulators, and is free from space and time fluctuations. A high-current negative-ion source and a medium current negative-ion implanter developed for this technique are described with the design concepts. In addition, the fundamental measurements of interactions between the negative-ion beam and the gas/solid are also described.
AB - Negative-ion implantation is a promising technique for charging-free implantation for the forthcoming ULSI fabrication, in which the water charging by positive-ion implantation will become a troublesome problem even with an electron shower. The negative-ion implantation technique remarkably ameliorates such a charging problem since the incoming negative charge of implanted negative ions is easily balanced by the outgoing negative charge of a part of secondary electrons. Thus, the surface charging voltage is maintained to within about ± 10 V for isolated conducting materials and insulators, and is free from space and time fluctuations. A high-current negative-ion source and a medium current negative-ion implanter developed for this technique are described with the design concepts. In addition, the fundamental measurements of interactions between the negative-ion beam and the gas/solid are also described.
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U2 - 10.1016/0168-583X(94)00444-7
DO - 10.1016/0168-583X(94)00444-7
M3 - Article
AN - SCOPUS:0001878342
SN - 0168-583X
VL - 96
SP - 7
EP - 12
JO - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
JF - Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
IS - 1-2
ER -