Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna

Kosuke Takenaka; Takashi Sera; Akinori Ebe; Yuichi Setsuhara

doi:10.1002/ppap.200732319

Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna

Kosuke Takenaka, Takashi Sera, Akinori Ebe, Yuichi Setsuhara

Research output: Contribution to journal › Article › peer-review

3 Citations (Scopus)

Abstract

We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low-inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 10¹² cm^-3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5-6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.

Original language	English
Pages (from-to)	S1013-S1016
Journal	Plasma Processes and Polymers
Volume	4
Issue number	SUPPL.1
DOIs	https://doi.org/10.1002/ppap.200732319
Publication status	Published - 2007
Externally published	Yes

Keywords

Antenna discharges
Internal antenna
Large-area
Plasma source
Plasma treatment

ASJC Scopus subject areas

Condensed Matter Physics
Polymers and Plastics

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10.1002/ppap.200732319

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title = "Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna",

abstract = "We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low-inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 1012 cm-3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5-6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.",

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author = "Kosuke Takenaka and Takashi Sera and Akinori Ebe and Yuichi Setsuhara",

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doi = "10.1002/ppap.200732319",

language = "English",

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T1 - Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna

AU - Takenaka, Kosuke

AU - Sera, Takashi

AU - Ebe, Akinori

AU - Setsuhara, Yuichi

PY - 2007

Y1 - 2007

N2 - We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low-inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 1012 cm-3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5-6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.

AB - We have investigated plasma profiles of inductively coupled plasmas (ICPs) sustained with a single low-inductance antenna (LIA) in terms of plasma density, electron temperature, and potential formation to understand effects of plasma properties in generation region (near antenna) and those in downstream region. The densities of plasmas sustained with a single antenna were as high as 1012 cm-3 near the antenna and had almost uniform profiles in the downstream region away from the single antenna about 100 mm. The floating potential as low as 5-6 V was achieved by effective suppression of electrostatic coupling due to lowering antenna RF voltage. The plasma density profile was independent of RF power.

KW - Antenna discharges

KW - Internal antenna

KW - Large-area

KW - Plasma source

KW - Plasma treatment

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DO - 10.1002/ppap.200732319

M3 - Article

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JO - Plasma Processes and Polymers

JF - Plasma Processes and Polymers

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ER -

Plasma profiles of inductively coupled plasmas sustained with low-inductance internal antenna

Abstract

Keywords

ASJC Scopus subject areas

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