Preparation and characterization of epitaxial FeTiO3+λ films

Tatsuo Fujii; Masakazu Kayano; Yusuke Takada; Makoto Nakanishi; Jun Takada

doi:10.1016/j.jmmm.2003.12.793

Preparation and characterization of epitaxial FeTiO_3+λ films

Tatsuo Fujii, Masakazu Kayano, Yusuke Takada, Makoto Nakanishi, Jun Takada

Research output: Contribution to journal › Article › peer-review

26 Citations (Scopus)

Abstract

Epitaxial FeTiO_3+λ(001) films were prepared on α-Al₂O₃(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO _3+λ film were largely dependent on the residual oxygen pressure (Po₂) during the sputtering deposition. The films prepared at lower Po₂ had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po₂. The oxidation state of Fe in FeTiO_3+λ films changed monotonically from Fe²⁺ to Fe³⁺ with increasing the Po₂. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO_3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.

Original language	English
Pages (from-to)	2010-2011
Number of pages	2
Journal	Journal of Magnetism and Magnetic Materials
Volume	272-276
Issue number	III
DOIs	https://doi.org/10.1016/j.jmmm.2003.12.793
Publication status	Published - May 2004

Keywords

Epitaxial films
Ferrimagnetism
Ilmenite
Ordered structure
Oxygen nonstoichiometry

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Condensed Matter Physics

Access to Document

10.1016/j.jmmm.2003.12.793

Cite this

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title = "Preparation and characterization of epitaxial FeTiO3+λ films",

abstract = "Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R{\=3}) structure, while a corundum (R{\=3}c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R{\=3} symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R{\=3}c symmetry were antiferromagnetic at room temperature.",

keywords = "Epitaxial films, Ferrimagnetism, Ilmenite, Ordered structure, Oxygen nonstoichiometry",

author = "Tatsuo Fujii and Masakazu Kayano and Yusuke Takada and Makoto Nakanishi and Jun Takada",

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T1 - Preparation and characterization of epitaxial FeTiO3+λ films

AU - Fujii, Tatsuo

AU - Kayano, Masakazu

AU - Takada, Yusuke

AU - Nakanishi, Makoto

AU - Takada, Jun

PY - 2004/5

Y1 - 2004/5

N2 - Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.

AB - Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.

KW - Epitaxial films

KW - Ferrimagnetism

KW - Ilmenite

KW - Ordered structure

KW - Oxygen nonstoichiometry

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