Preparation and characterization of epitaxial FeTiO3+λ films

Tatsuo Fujii, Masakazu Kayano, Yusuke Takada, Makoto Nakanishi, Jun Takada

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26 Citations (Scopus)


Epitaxial FeTiO3+λ(001) films were prepared on α-Al2O3(001) substrates by helicon plasma sputtering technique. Structure and magnetic properties of FeTiO 3+λ film were largely dependent on the residual oxygen pressure (Po2) during the sputtering deposition. The films prepared at lower Po2 had an ilmenite (R3̄) structure, while a corundum (R3̄c) structure was observed in the case of higher Po2. The oxidation state of Fe in FeTiO3+λ films changed monotonically from Fe2+ to Fe3+ with increasing the Po2. The films with the R3̄ symmetry were ferrimagnitic at low temperature, while the nonstoichiometric FeTiO3+λ with the R3̄c symmetry were antiferromagnetic at room temperature.

Original languageEnglish
Pages (from-to)2010-2011
Number of pages2
JournalJournal of Magnetism and Magnetic Materials
Issue numberIII
Publication statusPublished - May 2004


  • Epitaxial films
  • Ferrimagnetism
  • Ilmenite
  • Ordered structure
  • Oxygen nonstoichiometry

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics


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