Preparation and characterization of TiO2 thin films using vacuum ultraviolet light in a sol-gel process

Ken Ichi Katsumata; Akira Nakajima; Naoya Yoshida; Toshiya Watanabe; Yoshikazu Kameshima; Kiyoshi Okada

doi:10.1016/j.susc.2005.09.016

Preparation and characterization of TiO₂ thin films using vacuum ultraviolet light in a sol-gel process

Ken Ichi Katsumata, Akira Nakajima, Naoya Yoshida, Toshiya Watanabe, Yoshikazu Kameshima, Kiyoshi Okada

Research output: Contribution to journal › Article › peer-review

8 Citations (Scopus)

Abstract

In the current work, we prepared TiO₂ thin films using vacuum ultraviolet (VUV) irradiation of several different intensities before firing. We then investigated effects of VUV intensity and alkoxide mixtures on the microstructural evolution of the films. The microstructure of the film without VUV treatment comprises uniform anatase grains. Grains in films with VUV irradiation gradually form a domain-like microstructure with increasing VUV intensity. The heterogeneous hydrolysis rate in the mixed alkoxide will trigger formation of the domain-like microstructure.

Original language	English
Pages (from-to)	197-205
Number of pages	9
Journal	Surface Science
Volume	596
Issue number	1-3
DOIs	https://doi.org/10.1016/j.susc.2005.09.016
Publication status	Published - Dec 10 2005
Externally published	Yes

Keywords

Photoinduced hydrophilicity
Sol-gel
Thin film
Titanium dioxide

ASJC Scopus subject areas

Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Access to Document

10.1016/j.susc.2005.09.016

Cite this

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title = "Preparation and characterization of TiO2 thin films using vacuum ultraviolet light in a sol-gel process",

abstract = "In the current work, we prepared TiO2 thin films using vacuum ultraviolet (VUV) irradiation of several different intensities before firing. We then investigated effects of VUV intensity and alkoxide mixtures on the microstructural evolution of the films. The microstructure of the film without VUV treatment comprises uniform anatase grains. Grains in films with VUV irradiation gradually form a domain-like microstructure with increasing VUV intensity. The heterogeneous hydrolysis rate in the mixed alkoxide will trigger formation of the domain-like microstructure.",

keywords = "Photoinduced hydrophilicity, Sol-gel, Thin film, Titanium dioxide",

author = "Katsumata, {Ken Ichi} and Akira Nakajima and Naoya Yoshida and Toshiya Watanabe and Yoshikazu Kameshima and Kiyoshi Okada",

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T1 - Preparation and characterization of TiO2 thin films using vacuum ultraviolet light in a sol-gel process

AU - Katsumata, Ken Ichi

AU - Nakajima, Akira

AU - Yoshida, Naoya

AU - Watanabe, Toshiya

AU - Kameshima, Yoshikazu

AU - Okada, Kiyoshi

PY - 2005/12/10

Y1 - 2005/12/10

N2 - In the current work, we prepared TiO2 thin films using vacuum ultraviolet (VUV) irradiation of several different intensities before firing. We then investigated effects of VUV intensity and alkoxide mixtures on the microstructural evolution of the films. The microstructure of the film without VUV treatment comprises uniform anatase grains. Grains in films with VUV irradiation gradually form a domain-like microstructure with increasing VUV intensity. The heterogeneous hydrolysis rate in the mixed alkoxide will trigger formation of the domain-like microstructure.

AB - In the current work, we prepared TiO2 thin films using vacuum ultraviolet (VUV) irradiation of several different intensities before firing. We then investigated effects of VUV intensity and alkoxide mixtures on the microstructural evolution of the films. The microstructure of the film without VUV treatment comprises uniform anatase grains. Grains in films with VUV irradiation gradually form a domain-like microstructure with increasing VUV intensity. The heterogeneous hydrolysis rate in the mixed alkoxide will trigger formation of the domain-like microstructure.

KW - Photoinduced hydrophilicity

KW - Sol-gel

KW - Thin film

KW - Titanium dioxide

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