Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties

R. Morohashi; N. Wakiya; T. Kiguchi; T. Yoshioka; J. Tanaka; K. Shinozaki

Preparation of epitaxial LiNbO₃ thin film by MOCVD and its properties

R. Morohashi, N. Wakiya, T. Kiguchi, T. Yoshioka, J. Tanaka, K. Shinozaki

Research output: Contribution to journal › Article › peer-review

Abstract

Lithium niobate (LiNbO₃) thin films were deposited on Al ₂O₃(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C₂H₅)₅ as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO₃ thin films with stoichiometric composition were deposited on an Al₂O₃(001) substrate. The refractive index of the stoichiometric LiNbO₃ thin film was 2.24 at λ = 632.8 nm, which is close to that of bulk crystal.

Original language	English
Pages (from-to)	179-182
Number of pages	4
Journal	Key Engineering Materials
Volume	388
Publication status	Published - Jan 1 2009
Externally published	Yes

Keywords

Epitaxial film
LiNbO
MOCVD
Optical property
Refractive index
Thin film

ASJC Scopus subject areas

Materials Science(all)
Mechanics of Materials
Mechanical Engineering

Cite this

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title = "Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties",

abstract = "Lithium niobate (LiNbO3) thin films were deposited on Al 2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at λ = 632.8 nm, which is close to that of bulk crystal.",

keywords = "Epitaxial film, LiNbO, MOCVD, Optical property, Refractive index, Thin film",

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T1 - Preparation of epitaxial LiNbO3 thin film by MOCVD and its properties

AU - Morohashi, R.

AU - Wakiya, N.

AU - Kiguchi, T.

AU - Yoshioka, T.

AU - Tanaka, J.

AU - Shinozaki, K.

PY - 2009/1/1

Y1 - 2009/1/1

N2 - Lithium niobate (LiNbO3) thin films were deposited on Al 2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at λ = 632.8 nm, which is close to that of bulk crystal.

AB - Lithium niobate (LiNbO3) thin films were deposited on Al 2O3(001) substrates using metal-organic chemical vapor deposition (MOCVD), with Li(dpm) and Nb(C2H5)5 as precursors. By optimizing the conditions of thin film deposition, the c-axis oriented and epitaxially grown LiNbO3 thin films with stoichiometric composition were deposited on an Al2O3(001) substrate. The refractive index of the stoichiometric LiNbO3 thin film was 2.24 at λ = 632.8 nm, which is close to that of bulk crystal.

KW - Epitaxial film

KW - LiNbO

KW - MOCVD

KW - Optical property

KW - Refractive index

KW - Thin film

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Preparation of epitaxial LiNbO₃ thin film by MOCVD and its properties

Abstract

Keywords

ASJC Scopus subject areas

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