Processing and properties of transparent sulfated TiO2 thin films using sol-gel method

Akira Nakajima; Aiko Nakamura; Naoki Arimitsu; Yoshikazu Kameshima; Kiyoshi Okada

doi:10.1016/j.tsf.2007.12.161

Processing and properties of transparent sulfated TiO₂ thin films using sol-gel method

Akira Nakajima, Aiko Nakamura, Naoki Arimitsu, Yoshikazu Kameshima, Kiyoshi Okada

Research output: Contribution to journal › Article › peer-review

17 Citations (Scopus)

Abstract

For this study, transparent sulfated TiO₂ thin films were prepared from Ti alkoxide. Vacuum ultraviolet illumination in air at 180 °C was demonstrated to be an effective pretreatment for reproducible preparation of crack-free sulfated TiO₂ thin films. The film provides a high photoinduced wettability conversion rate and photocatalytic decomposition efficiency on gaseous n-hexane under proper conditions. This result is attributable to the accelerated decomposition of intermediates by a strong inorganic acid on the surface or to the resultant high quantum yield by suppressing the recombination between electrons and holes on the film surface.

Original language	English
Pages (from-to)	6392-6397
Number of pages	6
Journal	Thin Solid Films
Volume	516
Issue number	18
DOIs	https://doi.org/10.1016/j.tsf.2007.12.161
Publication status	Published - Jul 31 2008
Externally published	Yes

Keywords

Acidity
Photocatalysis
Sulfur
Titanium oxide

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Surfaces and Interfaces
Surfaces, Coatings and Films
Metals and Alloys
Materials Chemistry

Access to Document

10.1016/j.tsf.2007.12.161

Cite this

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title = "Processing and properties of transparent sulfated TiO2 thin films using sol-gel method",

abstract = "For this study, transparent sulfated TiO2 thin films were prepared from Ti alkoxide. Vacuum ultraviolet illumination in air at 180 °C was demonstrated to be an effective pretreatment for reproducible preparation of crack-free sulfated TiO2 thin films. The film provides a high photoinduced wettability conversion rate and photocatalytic decomposition efficiency on gaseous n-hexane under proper conditions. This result is attributable to the accelerated decomposition of intermediates by a strong inorganic acid on the surface or to the resultant high quantum yield by suppressing the recombination between electrons and holes on the film surface.",

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AU - Nakajima, Akira

AU - Nakamura, Aiko

AU - Arimitsu, Naoki

AU - Kameshima, Yoshikazu

AU - Okada, Kiyoshi

PY - 2008/7/31

Y1 - 2008/7/31

N2 - For this study, transparent sulfated TiO2 thin films were prepared from Ti alkoxide. Vacuum ultraviolet illumination in air at 180 °C was demonstrated to be an effective pretreatment for reproducible preparation of crack-free sulfated TiO2 thin films. The film provides a high photoinduced wettability conversion rate and photocatalytic decomposition efficiency on gaseous n-hexane under proper conditions. This result is attributable to the accelerated decomposition of intermediates by a strong inorganic acid on the surface or to the resultant high quantum yield by suppressing the recombination between electrons and holes on the film surface.

AB - For this study, transparent sulfated TiO2 thin films were prepared from Ti alkoxide. Vacuum ultraviolet illumination in air at 180 °C was demonstrated to be an effective pretreatment for reproducible preparation of crack-free sulfated TiO2 thin films. The film provides a high photoinduced wettability conversion rate and photocatalytic decomposition efficiency on gaseous n-hexane under proper conditions. This result is attributable to the accelerated decomposition of intermediates by a strong inorganic acid on the surface or to the resultant high quantum yield by suppressing the recombination between electrons and holes on the film surface.

KW - Acidity

KW - Photocatalysis

KW - Sulfur

KW - Titanium oxide

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