Supercritical resist dryer

Hideo Namatsu, Kenji Yamazaki, Kenji Kurihara

Research output: Contribution to journalArticlepeer-review

50 Citations (Scopus)


A supercritical resist dryer (SRD) based on supercritical (SC) drying by controlling moisture is developed. It was effective to dry using SC CO2 at a lower pressure just above the critical point, and adding a pumping system of SC CO2 to the Teflon-coated chamber to reduce water contamination. The SRD yielded high-aspect-ratio resist patterns without any pattern collapse or deformation.

Original languageEnglish
Pages (from-to)780-784
Number of pages5
JournalJournal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
Issue number2
Publication statusPublished - Mar 2000

ASJC Scopus subject areas

  • Condensed Matter Physics
  • Electrical and Electronic Engineering


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