Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography

K. Nishihara; T. Nishikawa; A. Sasaki; T. Kawamura; A. Sunahara; H. Furukawa; M. Murakami; H. Nishimura; Y. Shimada; M. Nakai; S. Fujioka; K. Shigemori; S. Uchida; K. Fujima; R. More; F. Koike; T. Kagawa; V. Zhakhovskii; K. Hashimoto; M. Yamaura; R. Matsui; T. Hibino; T. Okuno; Y. Tao; F. L. Sohnatzadeh; K. Nagai; T. Norimatsu; H. Tanuma; N. Miyanaga; Y. Izawa

Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography

K. Nishihara, T. Nishikawa, A. Sasaki, T. Kawamura, A. Sunahara, H. Furukawa, M. Murakami, H. Nishimura, Y. Shimada, M. Nakai, S. Fujioka, K. Shigemori, S. Uchida, K. Fujima, R. More, F. Koike, T. Kagawa, V. Zhakhovskii, K. Hashimoto, M. YamauraR. Matsui, T. Hibino, T. Okuno, Y. Tao, F. L. Sohnatzadeh, K. Nagai, T. Norimatsu, H. Tanuma, N. Miyanaga, Y. Izawa

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

3 Citations (Scopus)

Abstract

A design window of laser and plasma parameters required for an extreme ultraviolet (EUV) radiation source for practical application for the next generation of lithography has been introduced. We present a simple analytical model of conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2 % bandwidth, by considering power balance of laser produced high-z plasma. We also investigate dependence of the EUV emission from tin and tin-oxide plasmas on laser intensity and wavelength in spherical geometry using the GEKKO XII laser system. It is found that the conversion efficiency into a 2% bandwidth about 13.5 nm has a maximum of a few percent near the laser intensity 10 ¹¹ W/cm ². The efficiency is about the same for 1.053 μm and 0.527 μm laser wavelengths. A scaling law of the conversion efficiency on the laser intensity obtained agrees fairly well with the experimental results. The model also explains many features of the spectrum observed in the experiments.

Original language	English
Title of host publication	Inertial Fusion Sciences and Applications 2003
Editors	B.A. Hammel, D.D. Meyerhofer, J. Meyer-ter-Vehn
Pages	1069-1073
Number of pages	5
Publication status	Published - 2004
Event	Third International Conference on Inertial Fusion Sciences and Applications, IFSA 2003 - Monterey, CA, United States Duration: Sept 7 2003 → Sept 12 2003

Publication series

Name	Inertial Fusion Sciences and Applications 2003

Other

Other	Third International Conference on Inertial Fusion Sciences and Applications, IFSA 2003
Country/Territory	United States
City	Monterey, CA
Period	9/7/03 → 9/12/03

ASJC Scopus subject areas

Engineering(all)

Cite this

Nishihara, K., Nishikawa, T., Sasaki, A., Kawamura, T., Sunahara, A., Furukawa, H., Murakami, M., Nishimura, H., Shimada, Y., Nakai, M., Fujioka, S., Shigemori, K., Uchida, S., Fujima, K., More, R., Koike, F., Kagawa, T., Zhakhovskii, V., Hashimoto, K., ... Izawa, Y. (2004). Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography. In B. A. Hammel, D. D. Meyerhofer, & J. Meyer-ter-Vehn (Eds.), Inertial Fusion Sciences and Applications 2003 (pp. 1069-1073). (Inertial Fusion Sciences and Applications 2003).

Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography. / Nishihara, K.; Nishikawa, T.; Sasaki, A. et al.
Inertial Fusion Sciences and Applications 2003. ed. / B.A. Hammel; D.D. Meyerhofer; J. Meyer-ter-Vehn. 2004. p. 1069-1073 (Inertial Fusion Sciences and Applications 2003).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Nishihara, K, Nishikawa, T, Sasaki, A, Kawamura, T, Sunahara, A, Furukawa, H, Murakami, M, Nishimura, H, Shimada, Y, Nakai, M, Fujioka, S, Shigemori, K, Uchida, S, Fujima, K, More, R, Koike, F, Kagawa, T, Zhakhovskii, V, Hashimoto, K, Yamaura, M, Matsui, R, Hibino, T, Okuno, T, Tao, Y, Sohnatzadeh, FL, Nagai, K, Norimatsu, T, Tanuma, H, Miyanaga, N & Izawa, Y 2004, Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography. in BA Hammel, DD Meyerhofer & J Meyer-ter-Vehn (eds), Inertial Fusion Sciences and Applications 2003. Inertial Fusion Sciences and Applications 2003, pp. 1069-1073, Third International Conference on Inertial Fusion Sciences and Applications, IFSA 2003, Monterey, CA, United States, 9/7/03.

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abstract = "A design window of laser and plasma parameters required for an extreme ultraviolet (EUV) radiation source for practical application for the next generation of lithography has been introduced. We present a simple analytical model of conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2 % bandwidth, by considering power balance of laser produced high-z plasma. We also investigate dependence of the EUV emission from tin and tin-oxide plasmas on laser intensity and wavelength in spherical geometry using the GEKKO XII laser system. It is found that the conversion efficiency into a 2% bandwidth about 13.5 nm has a maximum of a few percent near the laser intensity 10 11 W/cm 2. The efficiency is about the same for 1.053 μm and 0.527 μm laser wavelengths. A scaling law of the conversion efficiency on the laser intensity obtained agrees fairly well with the experimental results. The model also explains many features of the spectrum observed in the experiments.",

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AU - Nishihara, K.

AU - Nishikawa, T.

AU - Sasaki, A.

AU - Kawamura, T.

AU - Sunahara, A.

AU - Furukawa, H.

AU - Murakami, M.

AU - Nishimura, H.

AU - Shimada, Y.

AU - Nakai, M.

AU - Fujioka, S.

AU - Shigemori, K.

AU - Uchida, S.

AU - Fujima, K.

AU - More, R.

AU - Koike, F.

AU - Kagawa, T.

AU - Zhakhovskii, V.

AU - Hashimoto, K.

AU - Yamaura, M.

AU - Matsui, R.

AU - Hibino, T.

AU - Okuno, T.

AU - Tao, Y.

AU - Sohnatzadeh, F. L.

AU - Nagai, K.

AU - Norimatsu, T.

AU - Tanuma, H.

AU - Miyanaga, N.

AU - Izawa, Y.

PY - 2004

Y1 - 2004

N2 - A design window of laser and plasma parameters required for an extreme ultraviolet (EUV) radiation source for practical application for the next generation of lithography has been introduced. We present a simple analytical model of conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2 % bandwidth, by considering power balance of laser produced high-z plasma. We also investigate dependence of the EUV emission from tin and tin-oxide plasmas on laser intensity and wavelength in spherical geometry using the GEKKO XII laser system. It is found that the conversion efficiency into a 2% bandwidth about 13.5 nm has a maximum of a few percent near the laser intensity 10 11 W/cm 2. The efficiency is about the same for 1.053 μm and 0.527 μm laser wavelengths. A scaling law of the conversion efficiency on the laser intensity obtained agrees fairly well with the experimental results. The model also explains many features of the spectrum observed in the experiments.

AB - A design window of laser and plasma parameters required for an extreme ultraviolet (EUV) radiation source for practical application for the next generation of lithography has been introduced. We present a simple analytical model of conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2 % bandwidth, by considering power balance of laser produced high-z plasma. We also investigate dependence of the EUV emission from tin and tin-oxide plasmas on laser intensity and wavelength in spherical geometry using the GEKKO XII laser system. It is found that the conversion efficiency into a 2% bandwidth about 13.5 nm has a maximum of a few percent near the laser intensity 10 11 W/cm 2. The efficiency is about the same for 1.053 μm and 0.527 μm laser wavelengths. A scaling law of the conversion efficiency on the laser intensity obtained agrees fairly well with the experimental results. The model also explains many features of the spectrum observed in the experiments.

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BT - Inertial Fusion Sciences and Applications 2003

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Y2 - 7 September 2003 through 12 September 2003

ER -

Theoretical modeling of laser-produced plasmas for development of extreme UV radiation source for lithography

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