Abstract
We have devised a new technology for 10-nm-order three-dimensional nanofabrication (3D-NANO) by electron-beam nanolithography (EBL) that involves repeating the e-beam exposure, rotation, and if necessary, other processes like development and etching. 3D-NANO was achieved through the combination of a rotation drive in the EBL apparatus, a focusing system, and a beam positioning method that uses the transmission signal to provide an accuracy of 10-nm order. The fabrication of a nanofilter and nanopillars on a sphere have demonstrated that our 3D-NANO technique can create 3D structures with a resolution on the order of 10 nm and a high degree of freedom. It should have many applications in biology, chemistry, medicine, nanoelectronics, and nano-machining.
| Original language | English |
|---|---|
| Pages (from-to) | 609-612 |
| Number of pages | 4 |
| Journal | Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS) |
| Publication status | Published - Jul 19 2004 |
| Event | 17th IEEE International Conference on Micro Electro Mechanical Systems (MEMS): Maastricht MEMS 2004 Technical Digest - Maastricht, Netherlands Duration: Jan 25 2004 → Jan 29 2004 |
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Condensed Matter Physics
- Mechanical Engineering
- Electrical and Electronic Engineering