Unveiling the magic of H2S on the CVD-Al2O3 coating

T. Oshika; A. Nishiyama; K. Nakaso; M. Shimada; K. Okuyama

Unveiling the magic of H₂S on the CVD-Al₂O₃ coating

T. Oshika, A. Nishiyama, K. Nakaso, M. Shimada, K. Okuyama

Research output: Contribution to journal › Conference article › peer-review

Abstract

The role of H₂S in the mechanism of CVD-Al₂O₃ coating was investigated by measuring particles suspended in the gas phase with an optical particle counter. H₂S doping of the CVD-Al₂O₃ process improves the homogeneity of thickness and growth rate of the Al₂O₃ layer. The number of particles produced in the reactor whose size was larger than 200 nm was dramatically reduced by H₂S doping. The effect of H₂S doping appears to be a reduction of the size of Al₂O₃ particles present in the reactor. These smaller particles have a greater mobility, which will allow them to arrive at the surface, regardless of the shape or arrangement of the substrate inside the reactor.

Original language	English
Pages (from-to)	Pr8-877 - Pr8-883
Journal	Journal De Physique. IV : JP
Volume	9 pt 2
Issue number	8
Publication status	Published - Sept 1 1999
Externally published	Yes
Event	Proceedings of the 1999 12th European Conference on Chemical Vapour Deposition ((EUROCVD12) - Barcelona, Spain Duration: Sept 5 1999 → Sept 10 1999

ASJC Scopus subject areas

Physics and Astronomy(all)

Cite this

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title = "Unveiling the magic of H2S on the CVD-Al2O3 coating",

abstract = "The role of H2S in the mechanism of CVD-Al2O3 coating was investigated by measuring particles suspended in the gas phase with an optical particle counter. H2S doping of the CVD-Al2O3 process improves the homogeneity of thickness and growth rate of the Al2O3 layer. The number of particles produced in the reactor whose size was larger than 200 nm was dramatically reduced by H2S doping. The effect of H2S doping appears to be a reduction of the size of Al2O3 particles present in the reactor. These smaller particles have a greater mobility, which will allow them to arrive at the surface, regardless of the shape or arrangement of the substrate inside the reactor.",

author = "T. Oshika and A. Nishiyama and K. Nakaso and M. Shimada and K. Okuyama",

year = "1999",

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language = "English",

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journal = "European Physical Journal: Special Topics",

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note = "Proceedings of the 1999 12th European Conference on Chemical Vapour Deposition ((EUROCVD12) ; Conference date: 05-09-1999 Through 10-09-1999",

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TY - JOUR

T1 - Unveiling the magic of H2S on the CVD-Al2O3 coating

AU - Oshika, T.

AU - Nishiyama, A.

AU - Nakaso, K.

AU - Shimada, M.

AU - Okuyama, K.

PY - 1999/9/1

Y1 - 1999/9/1

N2 - The role of H2S in the mechanism of CVD-Al2O3 coating was investigated by measuring particles suspended in the gas phase with an optical particle counter. H2S doping of the CVD-Al2O3 process improves the homogeneity of thickness and growth rate of the Al2O3 layer. The number of particles produced in the reactor whose size was larger than 200 nm was dramatically reduced by H2S doping. The effect of H2S doping appears to be a reduction of the size of Al2O3 particles present in the reactor. These smaller particles have a greater mobility, which will allow them to arrive at the surface, regardless of the shape or arrangement of the substrate inside the reactor.

AB - The role of H2S in the mechanism of CVD-Al2O3 coating was investigated by measuring particles suspended in the gas phase with an optical particle counter. H2S doping of the CVD-Al2O3 process improves the homogeneity of thickness and growth rate of the Al2O3 layer. The number of particles produced in the reactor whose size was larger than 200 nm was dramatically reduced by H2S doping. The effect of H2S doping appears to be a reduction of the size of Al2O3 particles present in the reactor. These smaller particles have a greater mobility, which will allow them to arrive at the surface, regardless of the shape or arrangement of the substrate inside the reactor.

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M3 - Conference article

AN - SCOPUS:0033188084

SN - 1951-6355

VL - 9 pt 2

SP - Pr8-877 - Pr8-883

JO - European Physical Journal: Special Topics

JF - European Physical Journal: Special Topics

IS - 8

T2 - Proceedings of the 1999 12th European Conference on Chemical Vapour Deposition ((EUROCVD12)

Y2 - 5 September 1999 through 10 September 1999

ER -

Unveiling the magic of H₂S on the CVD-Al₂O₃ coating

Abstract

ASJC Scopus subject areas

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