Volume diffusion of atomic oxygen in α-SiO2 protective coating at various temperatures

Masahito Tagawa, Hiroshi Kinoshita, Yuichiro Ninomiya

    Research output: Contribution to journalConference articlepeer-review


    The minimum thickness for an amorphous silicon dioxide (α-SiO2) protective coating required to prevent volume diffusion of atomic oxygen in a low Earth orbit (LEO) was evaluated by measuring the oxide thickness formed on Si (001) wafers in a hyperthermal atomic oxygen beam. The thickness of oxide film was measured with X-ray photoelectron spectroscopy. The diffusion length of atomic oxygen in α-SiO2 at temperatures between 297 K to 493 K, where exterior surfaces of a spacecraft may be heated in LEO, shows temperature and flux dependencies. The ground-based testing condition to evaluate performances of protective coatings will also be discussed.

    Original languageEnglish
    Pages (from-to)I/-
    JournalInternational SAMPE Symposium and Exhibition (Proceedings)
    Publication statusPublished - 1999
    EventProceedings of the 1999 44th International SAMPE Symposium and Exhibition 'Envolving and Revolutionary Technologies for the New Millennium', SAMPE '99 - Long Beach, CA, USA
    Duration: May 23 1999May 27 1999

    ASJC Scopus subject areas

    • General Materials Science
    • Mechanics of Materials
    • Mechanical Engineering


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