TY - JOUR
T1 - Angle-resolved photoemission study of Si electronic structure
T2 - Boron concentration dependence
AU - Wakita, Takanori
AU - Okazaki, Hiroyuki
AU - Takano, Yoshihiko
AU - Hirai, Masaaki
AU - Muraoka, Yuji
AU - Yokoya, Takayoshi
N1 - Funding Information:
This work was supported partially by a Grant-in-Aid for Scientific Research of the Ministry of Education, Culture, Sports, Science and Technology, Japan.
PY - 2010/12
Y1 - 2010/12
N2 - The boron concentration dependence of the Si electronic structure of Si(1 0 0)2 × 1 surfaces were investigated by angle-resolved photoemission spectroscopy (ARPES). The ARPES spectra exhibit rigid shifts toward lower binding energy as the boron concentration increases. The band dispersion was obtained from fitting procedure, and it is found that the top of the valence band does not exceed the Fermi level even with a boron concentration 35 times larger than the critical concentration of the metal-insulator transition.
AB - The boron concentration dependence of the Si electronic structure of Si(1 0 0)2 × 1 surfaces were investigated by angle-resolved photoemission spectroscopy (ARPES). The ARPES spectra exhibit rigid shifts toward lower binding energy as the boron concentration increases. The band dispersion was obtained from fitting procedure, and it is found that the top of the valence band does not exceed the Fermi level even with a boron concentration 35 times larger than the critical concentration of the metal-insulator transition.
KW - Elemental semiconductor
KW - Metal-insulator transitions
KW - Photoemission spectroscopy
KW - Silicon superconductor
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U2 - 10.1016/j.physc.2009.11.028
DO - 10.1016/j.physc.2009.11.028
M3 - Article
AN - SCOPUS:78649694216
SN - 0921-4534
VL - 470
SP - S641-S643
JO - Physica C: Superconductivity and its Applications
JF - Physica C: Superconductivity and its Applications
IS - SUPPL.1
ER -