Effect of microwave annealing on oxide-semiconductor-precursor ink

Hea Jeong Cheong; Nobuko Fukuda; Shintaro Ogura; Heisuke Sakai; Manabu Yoshida; Takehito Kodzasa; Hideo Tokuhisa; Kazuhiko Tokoro; Kazuhiko Takeuchi; Ritsuko Nagahata; Takashi Nakamura; Sei Uemura

doi:10.2494/photopolymer.27.339

Effect of microwave annealing on oxide-semiconductor-precursor ink

Hea Jeong Cheong, Nobuko Fukuda, Shintaro Ogura, Heisuke Sakai, Manabu Yoshida, Takehito Kodzasa, Hideo Tokuhisa, Kazuhiko Tokoro, Kazuhiko Takeuchi, Ritsuko Nagahata, Takashi Nakamura, Sei Uemura

研究成果 › 査読

6 被引用数 (Scopus)

本文言語	English
ページ（範囲）	339-342
ページ数	4
ジャーナル	Journal of Photopolymer Science and Technology
巻	27
号	3
DOI	https://doi.org/10.2494/photopolymer.27.339
出版ステータス	Published - 9月 5 2014
外部発表	はい

ASJC Scopus subject areas

ポリマーおよびプラスチック
有機化学
材料化学

文献へのアクセス

10.2494/photopolymer.27.339

他のファイルとリンク

引用スタイル

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AU - Cheong, Hea Jeong

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AU - Ogura, Shintaro

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AU - Yoshida, Manabu

AU - Kodzasa, Takehito

AU - Tokuhisa, Hideo

AU - Tokoro, Kazuhiko

AU - Takeuchi, Kazuhiko

AU - Nagahata, Ritsuko

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