In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope

Takayuki Muro; Yukako Kato; Tomohiro Matsushita; Toyohiko Kinoshita; Yoshio Watanabe; Akira Sekiyama; Hiroshi Sugiyama; Masato Kimura; Satoshi Komori; Shigemasa Suga; Hiroyuki Okazaki; Takayoshi Yokoya

doi:10.1063/1.3124145

In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope

Takayuki Muro, Yukako Kato, Tomohiro Matsushita, Toyohiko Kinoshita, Yoshio Watanabe, Akira Sekiyama, Hiroshi Sugiyama, Masato Kimura, Satoshi Komori, Shigemasa Suga, Hiroyuki Okazaki, Takayoshi Yokoya

研究成果 › 査読

7 被引用数 (Scopus)

抄録

A method to position samples with small cleaved regions has been developed to be applied to the angle-resolved photoemission spectroscopy (ARPES) which uses soft-x-ray synchrotron radiation focused down to 160×180 μ m ². A long-working-distance optical microscope is used for the sample observation. A selected region on a sample can be optimally set at the position of measurements, which is realized by the spatial resolution of the photoelectron analyzer. Using this method, electronic band dispersions of bulk silicon have been measured by ARPES for a partially cleaved region with a size of ∼200×500 μ m².

本文言語	English
論文番号	053901
ジャーナル	Review of Scientific Instruments
巻	80
号	5
DOI	https://doi.org/10.1063/1.3124145
出版ステータス	Published - 2009

ASJC Scopus subject areas

器械工学

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10.1063/1.3124145

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引用スタイル

Muro, T., Kato, Y., Matsushita, T., Kinoshita, T., Watanabe, Y., Sekiyama, A., Sugiyama, H., Kimura, M., Komori, S., Suga, S., Okazaki, H., & Yokoya, T. (2009). In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope. Review of Scientific Instruments, 80(5), [053901]. https://doi.org/10.1063/1.3124145

Muro, T, Kato, Y, Matsushita, T, Kinoshita, T, Watanabe, Y, Sekiyama, A, Sugiyama, H, Kimura, M, Komori, S, Suga, S, Okazaki, H & Yokoya, T 2009, 'In situ positioning of a few hundred micrometer-sized cleaved surfaces for soft-x-ray angle-resolved photoemission spectroscopy by use of an optical microscope', Review of Scientific Instruments, vol. 80, no. 5, 053901. https://doi.org/10.1063/1.3124145

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abstract = "A method to position samples with small cleaved regions has been developed to be applied to the angle-resolved photoemission spectroscopy (ARPES) which uses soft-x-ray synchrotron radiation focused down to 160×180 μ m 2. A long-working-distance optical microscope is used for the sample observation. A selected region on a sample can be optimally set at the position of measurements, which is realized by the spatial resolution of the photoelectron analyzer. Using this method, electronic band dispersions of bulk silicon have been measured by ARPES for a partially cleaved region with a size of ∼200×500 μ m2.",

author = "Takayuki Muro and Yukako Kato and Tomohiro Matsushita and Toyohiko Kinoshita and Yoshio Watanabe and Akira Sekiyama and Hiroshi Sugiyama and Masato Kimura and Satoshi Komori and Shigemasa Suga and Hiroyuki Okazaki and Takayoshi Yokoya",

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AU - Muro, Takayuki

AU - Kato, Yukako

AU - Matsushita, Tomohiro

AU - Kinoshita, Toyohiko

AU - Watanabe, Yoshio

AU - Sekiyama, Akira

AU - Sugiyama, Hiroshi

AU - Kimura, Masato

AU - Komori, Satoshi

AU - Suga, Shigemasa

AU - Okazaki, Hiroyuki

AU - Yokoya, Takayoshi

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