Low-temperature fabrication of ion-induced Ge nanostructures: Effect of simultaneous Al supply

Ako Miyawaki, Toshiaki Hayashi, Masaki Tanemura, Yasuhiko Hayashi, Tomoharu Tokunaga, Tetsuo Soga

研究成果査読

1 被引用数 (Scopus)

抄録

Ge surfaces were irradiated by Ar+ ions at 600 eV with and without simultaneous supply of Ge or Al at room temperature. The surfaces ion-irradiated without any simultaneous metal supply were characterized by densely distributed conical protrusions. By contrast, various kinds of nanostructures were formed on the Ge surfaces ion-irradiated with a simultaneous metal supply. They featured cones and nanobelts with a flattened top for Ge supply cases, whereas they were characterized by the nanorods, nanobelts and nanowalls for Al supply cases. Very interestingly, most of the nanorods and nanobelts formed with an Al supply possessed a bottleneck structure. Thus, the Ge nanostructures were controllable in morphology by species and amount of simultaneously supplied metals.

本文言語English
ページ(範囲)1417-1420
ページ数4
ジャーナルIEICE Transactions on Electronics
E92-C
12
DOI
出版ステータスPublished - 1月 1 2009
外部発表はい

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 電子工学および電気工学

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