抄録
For this study, transparent sulfated TiO2 thin films were prepared from Ti alkoxide. Vacuum ultraviolet illumination in air at 180 °C was demonstrated to be an effective pretreatment for reproducible preparation of crack-free sulfated TiO2 thin films. The film provides a high photoinduced wettability conversion rate and photocatalytic decomposition efficiency on gaseous n-hexane under proper conditions. This result is attributable to the accelerated decomposition of intermediates by a strong inorganic acid on the surface or to the resultant high quantum yield by suppressing the recombination between electrons and holes on the film surface.
本文言語 | English |
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ページ(範囲) | 6392-6397 |
ページ数 | 6 |
ジャーナル | Thin Solid Films |
巻 | 516 |
号 | 18 |
DOI | |
出版ステータス | Published - 7月 31 2008 |
外部発表 | はい |
ASJC Scopus subject areas
- 電子材料、光学材料、および磁性材料
- 表面および界面
- 表面、皮膜および薄膜
- 金属および合金
- 材料化学