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Rewriting of low electrical resistance lines on TiO 2 film by writing and erasing with femtosecond and CW fiber lasers

  • Masahiro Tsukamoto
  • , Ryosuke Nishii
  • , Yu Muraki
  • , Togo Shinonaga
  • , Minoru Yoshida
  • , Masanari Takahashi
  • , Nobuyuki Abe

研究成果査読

抄録

A rewriting process was developed for reduced electrical resistance lines on a titanium dioxide (TiO 2 ) film with femtosecond and CW fiber lasers. In this process, lines are written on TiO 2 film by femtosecond laser irradiation, where the lines have a lower electrical resistance than the surrounding film. By heating with a CW fiber laser in air, the low electrical resistance lines are erased and their electrical resistances increase. When the erased areas on the TiO 2 film are irradiated with the femtosecond laser, the lower electrical resistance lines can be rewritten on the film surface.

本文言語English
ページ(範囲)730-735
ページ数6
ジャーナルApplied Surface Science
313
DOI
出版ステータスPublished - 9月 15 2014
外部発表はい

ASJC Scopus subject areas

  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 表面および界面

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