TY - JOUR
T1 - Theoretical simulation of extreme UV radiation source for lithography
AU - Fujima, K.
AU - Nishihara, K.
AU - Kawamura, T.
AU - Furukawa, H.
AU - Kagawa, T.
AU - Koike, F.
AU - More, R.
AU - Murakami, M.
AU - Nishikawa, T.
AU - Sasaki, A.
AU - Sunahara, A.
AU - Zhakhovskii, V.
AU - Fujimoto, T.
AU - Tanuma, H.
PY - 2004
Y1 - 2004
N2 - A possible design window for extreme ultraviolet (EUV) radiation source has been introduced, which is needed for its realistic use for next generation lithography. For this goal, we have prepared a set of numerical simulation codes to estimate the conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2% bandwidth, which includes atomic structure, opacity and emissibity and hydro dynamics codes. The simulation explains well the observed conversion efficiency dependence of incident power using GEKKO XII laser system as well as spectral shapes. It is found that the conversion efficiency into 13.5 nm at 2% bandwidth has its maximum of a few percent at the laser intensity 1-2 × 10 11 W/cm 2.
AB - A possible design window for extreme ultraviolet (EUV) radiation source has been introduced, which is needed for its realistic use for next generation lithography. For this goal, we have prepared a set of numerical simulation codes to estimate the conversion efficiency from laser energy to radiation energy with a wavelength of 13.5 nm with 2% bandwidth, which includes atomic structure, opacity and emissibity and hydro dynamics codes. The simulation explains well the observed conversion efficiency dependence of incident power using GEKKO XII laser system as well as spectral shapes. It is found that the conversion efficiency into 13.5 nm at 2% bandwidth has its maximum of a few percent at the laser intensity 1-2 × 10 11 W/cm 2.
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U2 - 10.1117/12.534989
DO - 10.1117/12.534989
M3 - Conference article
AN - SCOPUS:3843119797
SN - 0277-786X
VL - 5374
SP - 405
EP - 412
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
IS - PART 1
T2 - Emerging Lithographic Technologies VIII
Y2 - 24 February 2004 through 26 February 2004
ER -