TY - JOUR
T1 - TiO 2 -based superhydrophobic-superhydrophilic patterns
T2 - Fabrication via an ink-jet technique and application in offset printing
AU - Nishimoto, Shunsuke
AU - Kubo, Atsushi
AU - Nohara, Kenji
AU - Zhang, Xintong
AU - Taneichi, Noriaki
AU - Okui, Toshiki
AU - Liu, Zhaoyue
AU - Nakata, Kazuya
AU - Sakai, Hideki
AU - Murakami, Taketoshi
AU - Abe, Masahiko
AU - Komine, Takashi
AU - Fujishima, Akira
N1 - Copyright:
Copyright 2019 Elsevier B.V., All rights reserved.
PY - 2009/4/1
Y1 - 2009/4/1
N2 - A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.
AB - A superhydrophobic-superhydrophilic pattern was prepared on an anodized Al plate by a new fabrication process. The process consists of five key steps: (1) TiO 2 coating of the plate, (2) surface modification with self-assembled monolayers (SAMs), (3) formation of aqueous UV light-resistant ink patterns by an ink-jet technique, (4) photocatalytic decomposition of SAMs and surface conversion to the superhydrophilic state and (5) removal of the aqueous ink patterns by water washing. It is particularly noteworthy that the wettability pattern can be quickly formed on the plate, without the use of a photomask. The fabricated superhydrophobic-superhydrophilic pattern is shown to be applicable to offset printing.
KW - Ink-jet technique
KW - Offset printing
KW - Self-assembled monolayers
KW - Superhydrophobic-superhydrophilic
KW - TiO photocatalyst
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U2 - 10.1016/j.apsusc.2009.01.084
DO - 10.1016/j.apsusc.2009.01.084
M3 - Article
AN - SCOPUS:62349093596
SN - 0169-4332
VL - 255
SP - 6221
EP - 6225
JO - Applied Surface Science
JF - Applied Surface Science
IS - 12
ER -