Two-axis-of-rotation drive system in electron-beam lithography apparatus for nanotechnology applications

K. Yamazaki, H. Namatsu


6 被引用数 (Scopus)


A two-axis-of-rotation drive system has been developed that enables electron-beam lithography (EBL) to be applied to three-dimensional (3D) nanofabrication. It is built on a pallet that can be loaded into the EBL apparatus, and rotates a sample while the e-beam writes on it. It has a positional accuracy of a few milliradians. In addition, a height-measurement system has also been developed. This helps to focus the e-beam on the surface of a rotating or non-planar sample, and enables fine patterns to be formed on such samples. These systems allow samples to be exposed to the e-beam from various directions, resulting in 3D fabrication with a high degree of freedom. A demonstration carried out on a polymethylmethacrylate sphere resulted in the formation of pillars with various shapes and about 100 nm in diameter.

ジャーナルMicroelectronic Engineering
出版ステータスPublished - 6月 2004
イベントMicro and Nano Engineering 2003 - Cambridge
継続期間: 9月 22 20039月 25 2003

ASJC Scopus subject areas

  • 電子材料、光学材料、および磁性材料
  • 原子分子物理学および光学
  • 凝縮系物理学
  • 表面、皮膜および薄膜
  • 電子工学および電気工学


「Two-axis-of-rotation drive system in electron-beam lithography apparatus for nanotechnology applications」の研究トピックを掘り下げます。これらがまとまってユニークなフィンガープリントを構成します。