TY - JOUR
T1 - Two-axis-of-rotation drive system in electron-beam lithography apparatus for nanotechnology applications
AU - Yamazaki, K.
AU - Namatsu, H.
PY - 2004/6
Y1 - 2004/6
N2 - A two-axis-of-rotation drive system has been developed that enables electron-beam lithography (EBL) to be applied to three-dimensional (3D) nanofabrication. It is built on a pallet that can be loaded into the EBL apparatus, and rotates a sample while the e-beam writes on it. It has a positional accuracy of a few milliradians. In addition, a height-measurement system has also been developed. This helps to focus the e-beam on the surface of a rotating or non-planar sample, and enables fine patterns to be formed on such samples. These systems allow samples to be exposed to the e-beam from various directions, resulting in 3D fabrication with a high degree of freedom. A demonstration carried out on a polymethylmethacrylate sphere resulted in the formation of pillars with various shapes and about 100 nm in diameter.
AB - A two-axis-of-rotation drive system has been developed that enables electron-beam lithography (EBL) to be applied to three-dimensional (3D) nanofabrication. It is built on a pallet that can be loaded into the EBL apparatus, and rotates a sample while the e-beam writes on it. It has a positional accuracy of a few milliradians. In addition, a height-measurement system has also been developed. This helps to focus the e-beam on the surface of a rotating or non-planar sample, and enables fine patterns to be formed on such samples. These systems allow samples to be exposed to the e-beam from various directions, resulting in 3D fabrication with a high degree of freedom. A demonstration carried out on a polymethylmethacrylate sphere resulted in the formation of pillars with various shapes and about 100 nm in diameter.
KW - 3D nanofabrication
KW - PMMA
KW - Rotation drive
KW - e-beam nanolithography
UR - http://www.scopus.com/inward/record.url?scp=6344224956&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=6344224956&partnerID=8YFLogxK
U2 - 10.1016/S0167-9317(04)00078-4
DO - 10.1016/S0167-9317(04)00078-4
M3 - Conference article
AN - SCOPUS:6344224956
SN - 0167-9317
VL - 73-74
SP - 85
EP - 89
JO - Microelectronic Engineering
JF - Microelectronic Engineering
T2 - Micro and Nano Engineering 2003
Y2 - 22 September 2003 through 25 September 2003
ER -